Joint Usage / Research Center

Summary and Call for Proposals

Summary and Call for Proposals

Joint Usage/Research Center of materials and systems for innovative energy management

IMaSS has been designated by the Ministry of Education, Culture, Sports, Science and Technology (MEXT) as a "Joint Usage/Research Center of materials and systems for innovative energy management." Through joint usage and research related to energy management technologies, it serves as a venue for everything from fundamental research through to system-building for actual deployment in society, aimed at more advanced, fully optimized energy creation, conversion, storage, transmission and utilization. At this facility, researchers from universities, research institutions and other organizations based in Japan and abroad can engage in joint research together with IMaSS personnel while utilizing a wide range of equipment including film-deposition systems, micro/nano-fabrication equipments, electron microscopes and many other types of analysis instruments, and more. If you wish to apply for joint usage or research at this facility, please consult with the IMaSS staff in advance and apply.

Facilities and Equipment

Coating Equipment

Facilities and Equipment Specifications Inquiry
Magnetron sputtering with 8 sources 8 cathodes with 2 inches
Sample size : 30x30 mm2
RF power sources : 500 W x 2
Sample heating : <600˚C
Ar ion etching source : <1 kV
Sample exchange chamber with 8 samples banking
Nano fabrication Platform
info*@*nanofab.engg.nagoya-u.ac.jp
MBE with 8 sources E-beam souces : 4cc x 4 and 2cc x 2
Sample size : 30x30 mm2
High voltage power souces : 3
Sample heating : <1000˚C
Ar ion etching source : <1 kV
RHEED with 25 kV
Nano fabrication Platform
info*@*nanofab.engg.nagoya-u.ac.jp
Magnetron sputtering with 3 sources Shimadzu HSR-522
3 cathodes with 4 inches
RF power sources : 500 W x 2
Reverse sputtering of sample, Sample rotation, Multi-layered deposition
Nano fabrication Platform
info*@*nanofab.engg.nagoya-u.ac.jp

Microfabrication/Processing Device

Facilities and Equipment Specifications Inquiry
Electron beam lithography JEOL JBX6300FS
Accelerating voltage:25/50/100kV
Minimum beam diameter:2nm
Beam current:100pA-2nA
Superimposing Accuracy:±9nm
Maximum sample size:8inchφ
Nano fabrication Platform
info*@*nanofab.engg.nagoya-u.ac.jp
Mask aligner Canon PLA-501(S)
Indefinite shape sample with thickness less than 0.7μm
Nano fabrication Platform
info*@*nanofab.engg.nagoya-u.ac.jp
ECR etching with SIMS ECR ion source:Irie Koken RGB-114
Microwave input power:150 W,
Accelerating voltage:600 V,Ion beam diameter:30mm
SSIMS analyzer:PFEIFFER EDP400
Mass analysis range:1-512 amu
Sample rotation and tilting mechanism
Nano fabrication Platform
info*@*nanofab.engg.nagoya-u.ac.jp
Ion implantation NISSIN Electric NH-20SR-WMH
Accelerating voltage:5-200kV
Beam current:1 µA~100 µA
Nano fabrication Platform
info*@*nanofab.engg.nagoya-u.ac.jp
Femto-second laser for micro-fabrication and measurement Kisou UFL-Hybrid System
Pulse Laser:1041 nm, 550 fs, 10 µJ (IMRA µjewel D-1000)
Harmonic generator:40% @520 nm, 5% @347 nm
(Micro-fabrication Station)
Maximum sample size:100 mm x 100 mm
Laser beam diameter for fabrication:3.5 µmφ
(Measurment Station)
Time resolved fluorescent, Spin dynamics of magnetic materials
(Optical Coherence Tomography Station)
Observation area:10 mm x 10 mm x 1.6 mm
Depth resolution:7 µm
Nano fabrication Platform
info*@*nanofab.engg.nagoya-u.ac.jp
Electric furnace Koyo Thermo System Co. MODEL272-2
Temperature range:400-1100˚C
Nano fabrication Platform
info*@*nanofab.engg.nagoya-u.ac.jp
Rapid thermal annealing AG Associates Heatpulse 610
Temperature range:400~1200˚C
Temperature rasing rate:200˚C/sec
Nano fabrication Platform
info*@*nanofab.engg.nagoya-u.ac.jp

Electronic Microscope & Associated Equipment

Facilities and Equipment Specifications Inquiry
Reaction science high voltage scanning TEM
JEM1000K RS
Acc. Vol.: 1000 kV (400, 600, 800 kV on demand)
Electron gun: Thermal (LaB6)
Mode: TEM/STEM
Anal. Tool: GIF (Quantum equivalent)
Recording: CCD (wide and high-res.)
Specimen holder: cooling, heating, cryo-transfer, nano-indentation, 3D tomography, other custom-made holders
E-cell: O2, N2, CO, H2,… up to 10,000 Pa
High voltage electron microscope laboratory
hvem*@*nagoya-microscopy.jp
Aberration corrected scanning TEM
JEM ARM200F
Acc. Vol.: 200 kV, 80 kV
Electron gun: Schottky FEG
Mode: TEM/STEM
Cs correction: probe & imaging
Anal. Tool: EDX (SDD: 60 mm2), GIF Quantum
Recording: CCD
Specimen holder: single-tilt, double-tilting, double-tilting Be analytical
Others: Bi-prism for holography, BSI detector
High voltage electron microscope laboratory
hvem*@*nagoya-microscopy.jp
Transmission electron microscope
JEM2100F-HK
Acc. Vol.: 200 kV, 80 kV
Electron gun: Schottky FEG
Mode: TEM/STEM
Cs correction: probe & imaging
Anal. Tool: EDX (SDD: 60 mm2), GIF Quantum
Recording: CCD
Specimen holder: single-tilt, double-tilting, double-tilting Be analytical
Others: Bi-prism for holography, BSI detector
High voltage electron microscope laboratory
hvem*@*nagoya-microscopy.jp
Transmission electron microscope
JEM2100F-HK
Acc. Vol.: 200kV
Electron gun: Schottky FEG
Mode: TEM/STEM
Anal. Tool: EDX (SDD: 60 mm2)
Recording: CCD
Specimen holder: double-tilting cooling, double-tilting heating, multi-sample, Be analytical
High voltage electron microscope laboratory
hvem*@*nagoya-microscopy.jp
Transmission Electron Microscope
JEM-2100plus
Shared Equipment Office
shared.equip*@*imass.nagoya-u.ac.jp
High voltage electron microscope laboratory
hvem*@*nagoya-microscopy.jp
Electron Spectroscopic scanning TEM
JEM2100M
Acc. Vol.: 80-200 kV
Electron gun: Thermal (LaB6)
Mode: TEM/STEM
Anal. Tool: EDX (SDD: 30 mm2), WDX, EELS (Enfina), CL
Recording: CCD
Specimen holder: single-tilt, double-tilting, double-tilting Be analytical, rotation, cooling & heating
Others: BSI detector
High voltage electron microscope laboratory
hvem*@*nagoya-microscopy.jp
High-speed sample fabrication/analysis system
MI-4000L
Acc vol.:30kV (FIB, SEM)
Anal. Tool: FE-SEM、EDS, EDSD
Micro-sampling, Slice & See
High voltage electron microscope laboratory
hvem*@*nagoya-microscopy.jp
Focused ion beam sample preparation system
FB-2100
Acc vol.:40kV
Micro-sampling
High voltage electron microscope laboratory
hvem*@*nagoya-microscopy.jp
Precision ion beam milling system
PIPS II
Ion energy: 100 eV~8 keV
Attachments: Digitally zooming microscope, specimen cooling stage
High voltage electron microscope laboratory
hvem*@*nagoya-microscopy.jp
Other instruments for sample preparation Low speed blade saw, wire saw, mechanical lapping system, jet polishing (EcoPol), ultramicrotomy, Cross-section polisher, Dimpling machine, Gentle mill, ion coating machine, etc High voltage electron microscope laboratory
hvem*@*nagoya-microscopy.jp
Field-emission scanning electron microscope JEOL JSM-6330F & JED-2140GS Shared Equipment Office
shared.equip*@*imass.nagoya-u.ac.jp
エネルギー分散型X線分析
装置付走査型電子顕微鏡
日立ハイテクノロジーズ S3000N
SEMEDXⅢTypeN1
SEI像分解能:3.0nm@ 25kV
COMPO像分解能:4.0nm
加速電圧:0.3~30kV
Shared Equipment Office
shared.equip*@*imass.nagoya-u.ac.jp
透過電子顕微鏡システム
日本電子 JEM-2010F
加速電圧200kV
点分解能0.19nm
STEM機能
Shared Equipment Office
shared.equip*@*imass.nagoya-u.ac.jp
FE-SEM JEOL JSM-6301F
Field-emission electron gun
Accelerating voltage: 0.5~30kV
Magnification: 10~500,000
Analysis with energy dispersive X-ray spectrometry
Nano fabrication Platform
info*@*nanofab.engg.nagoya-u.ac.jp

Analysis Measurement Equipment

Facilities and Equipment Specifications Inquiry
X-ray diffractometer RIGAKU ATX-G
X-ray sourse : Cu-Ka, 18kW
Multilayered focusing mirror
Ge monochromater
θ-2θscan mode,Rocking curve,Reciprocal lattice mapping, In-plane φ scan,φ-2θχscan
Nano fabrication Platform
info*@*nanofab.engg.nagoya-u.ac.jp
X-ray diffractometer RIGAKU RINT2500TTR Shared Equipment Office
shared.equip*@*imass.nagoya-u.ac.jp
Atomic force microscope Bruker, AXS Dimension3100
Scan range:XY axes 90μm,Z axis 6μm
Maximum sample size:150 mmφ-12mmt
Measurement mode : AFM,MFM,EFM,LFM,surface electric potential image,current image,lithography
Nano fabrication Platform
info*@*nanofab.engg.nagoya-u.ac.jp
Magnetometers Alternative gradient force magnetometer, sensitivity :10^-8emu,maximum field : 20kOe
Vibrating sample magnetometer, sensitivity :10^-5emu,maximum field : 15kOe
Torque magnetometer:sensitivity :2×10^-3erg,maximum field : 15kOe
Magneto-optical spectrometer, sensitivity :2×10^-3deg,maximum field : 16kOe
Nano fabrication Platform
info*@*nanofab.engg.nagoya-u.ac.jp
X-ray photoelectron spectrometer VG ESCALAB250
Mg/Al twin anode and Al monochromator
X ray source
Sample etching by Ar ion gun
Manipultor for angle resolved measurement
Nano fabrication Platform
info*@*nanofab.engg.nagoya-u.ac.jp
X-ray photoelectron spectrometer SHIMADZU ESCA-3300 Shared Equipment Office
shared.equip*@*imass.nagoya-u.ac.jp
イメージングXPSマイクロ
プローブ
サーモフィッシャー ESCALAB 250Xi
UPS, XPS両光電子分光計測が可能
XPS計測時:Mg, Al ツインアノード
利用可
最高エネルギー分解能:
0.5eV程度@Alkα
最高空間分解能:20μm
Shared Equipment Office
shared.equip*@*imass.nagoya-u.ac.jp
Inductively Coupled Plasma Atomic Emission Spectrometer Seiko Instruments, SPS7800 Shared Equipment Office
shared.equip*@*imass.nagoya-u.ac.jp
CHN coder (Yanaco) MT-6 Shared Equipment Office
shared.equip*@*imass.nagoya-u.ac.jp
Laser doppler velocimeter for one velocity component 1D-PDPA/FSA3500P Shared Equipment Office
shared.equip*@*imass.nagoya-u.ac.jp

Center for Integrated Research of Future Electronics / Center for Integrated Research of Future Electronics, Transformative Electronics Facilities

Facilities and Equipment Specifications Inquiry
Ion implanter
ULVAC IMX-3500
  C-TEFs
c-tefs*@*imass.nagoya-u.ac.jp
High Temperature Sputtering Deposition Equipment
ULVAC QAM4
  HONDA, Assoc. Prof.
FIB-SEM
HITACHI NX2000
  HONDA, Assoc. Prof.
In-lens SEM
HITACHI SU9000
  HONDA, Assoc. Prof.
Imaging CL
HORIBA WD201N
  HONDA, Assoc. Prof.
Work function measuring device
RIKEN KENKI AC-3
  HONDA, Assoc. Prof.
Emission microscope
HAMAMATSU PHOTONICS
PHEMOS-1000
  HONDA, Assoc. Prof.
i-line stepper
Nikon NSR-2205i12D
  C-TEFs
c-tefs*@*imass.nagoya-u.ac.jp
Nano inprint equipment
SCIVAX X-500
  C-TEFs
c-tefs*@*imass.nagoya-u.ac.jp
Laser Confocal Microscope
Olympus OLS-4100
  C-TEFs
c-tefs*@*imass.nagoya-u.ac.jp
RCA cleaning system
Dalton 18-MR 12
  C-TEFs
c-tefs*@*imass.nagoya-u.ac.jp
Organic cleaning system
Dalton 18-MU11
  C-TEFs
c-tefs*@*imass.nagoya-u.ac.jp
Stylus profiler
Bruker Dektak XT-A
  C-TEFs
c-tefs*@*imass.nagoya-u.ac.jp
ICP etching system 4
ULVAC CE-S
  C-TEFs
c-tefs*@*imass.nagoya-u.ac.jp
Atomic layer deposition system
(Plasma/Thermal)
Ultratech/CambridgeNanoTech Fiji G2
  C-TEFs
c-tefs*@*imass.nagoya-u.ac.jp
LP-CVD
samco LPD-1200
  C-TEFs
c-tefs*@*imass.nagoya-u.ac.jp
ICP etching system 1
samco RIE-200iP
  C-TEFs
c-tefs*@*imass.nagoya-u.ac.jp
ICP etching system 2
samco RIE-200iP
  C-TEFs
c-tefs*@*imass.nagoya-u.ac.jp
P-CVD1
samco PD-220NL
  C-TEFs
c-tefs*@*imass.nagoya-u.ac.jp
ICP etching system 3
ULVAC NE-550EX
  C-TEFs
c-tefs*@*imass.nagoya-u.ac.jp
EB evaporator
ULVAC ei-5
  C-TEFs
c-tefs*@*imass.nagoya-u.ac.jp
Sputtering system
ULVAC CS-L
  C-TEFs
c-tefs*@*imass.nagoya-u.ac.jp
Automated Thickness Mapping Systems
FILMETRICS F50
  C-TEFs
c-tefs*@*imass.nagoya-u.ac.jp
West bond 7200CR   HONDA, Assoc. Prof.
TECDIA TEC-2004TMR   HONDA, Assoc. Prof.
Nanofactor Fact-200   HONDA, Assoc. Prof.
West bond 7476D   HONDA, Assoc. Prof.

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Joint Research List

2021年度 名古屋大学未来材料・システム研究所共同利用・共同研究採択一覧

2020年度 名古屋大学未来材料・システム研究所共同利用・共同研究採択一覧

2019年度 名古屋大学未来材料・システム研究所共同利用・共同研究採択一覧

2018年度 名古屋大学未来材料・システム研究所共同利用・共同研究採択一覧

2017年度 名古屋大学未来材料・システム研究所共同利用・共同研究採択一覧

Joint Research Reports

2020年度

2019年度

2018年度

2017年度

2016年度