The Center for Integrated Research of Future Electronics-Transformative Electronics Facilities (C-TEFs) is an experimental facility for IMaSS at Nagoya University. It has a large clean room of about 1,000 m² (Class 1,000 exposure area; Class 10,000 process area) for conducting accelerated crystal growth, device processes and evaluation in GaN research and development.

Features

（１）Submicron processing line specialized for GaN Electronics

• Complete end-to-end process of GaN power devices from crystal growth to device fabrication
• Equipment capable of submicron feature fabrication, including an i-line stepper
• Operation management and contract fabrication services by technical development staff
• Shared user facility system with fee structure to allow use by outside organizations

（２）Target device

• GaN-on-GaN vertical power device
• GaN-based optical device
• AlGaN/GaN lateral HEMT device
• GaN future device

Since the installation of a 500 kV electron microscope in 1965, Nagoya University has seen prolific, world-leading research in the field of high voltage electron microscopes in Japan. In particular, the 1000 kV Reaction Science High Voltage Scanning Transmission Electron Microscope installed in 2010 enables reactions and phenomena occurring in gas environments to be observed, aiding in the research and development of environmental and energy-related materials. This microscope can significantly contribute to the field of green-innovation research. The laboratory is operated as an open research facility for all researchers in Nagoya University. Moving forward, as part of our efforts to become an international center of electron microscopy, joint projects with other universities, research institutes, and industries are encouraged.

The clean rooms and other laboratories of the Research Facility for Advanced Science and Technology are equipped with molecular beam epitaxy, chemical vapor deposition (CVD), a sputtering system, and other film deposition equipment; a mask aligner, electron-beam lithography, inductive coupled plasma (ICP) etching, and other micro-fabrication equipment; scanning electron microscopy (SEM), electron spectroscopy for chemical analysis (ESCA), an atomic force microscope, an x-ray diffractometer, and other analytical equipment; as well as a wide range of other leading-edge equipment which is put to use in a wide array of research operations ranging from thin-film deposition for various materials to micro- and nano-fabrication and material characterization. Furthermore, this facility enforces Nanofabrication Platform Consortium Project supported by the Japanese Ministry of Education, Culture, Sports, Science and Technology (MEXT), where the facility provides technical supports on nano-material processing and nano-fabrication for numerous researchers by utilizing multi-user instruments.