Nagoya University

Joint Usage / Research Center

IMaSS has been designated by the Ministry of Education, Culture, Sports, Science and Technology (MEXT) as a "joint Usage/Research Center of materials and systems for innovative energy management." Through joint usage and research related to energy management technologies, it serves as a venue for everything from fundamental research through to system-building for actual deployment in society, aimed at more advanced, fully optimized energy creation, conversion, storage, transmission and utilization. At this facility, researchers from universities, research institutions and other organizations based in Japan and abroad can engaged in joint research together with IMaSS personnel while utilizing a wide range of equipment including film-deposition systems, micro/nano-fabrication equipments, electron microscopes and many other types of analysis instruments, and more. If you wish to apply for joint usage or research at this facility, please consult with the IMaSS staff in advance and apply at the beginning of the academic year.

Facilities and Equipment

  • [Coating Equipment]
    Facilities and Equipment Specifications Inquiry
    magnetron sputtering with 8 sources Magnetron sputtering with 8 sources 8 cathodes with 2 inches
    Sample size : 30x30 mm2
    RF power sources : 500 W x 2
    Sample heating : <600˚C
    Ar ion etching source : <1 kV
    Sample exchange chamber with 8 samples banking
    Nano fabrication Platform
    info*@*nanofab.engg.nagoya-u.ac.jp
    MBE with 8 sources MBE with 8 sources E-beam souces : 4cc x 4 and 2cc x 2
    Sample size : 30x30 mm2
    High voltage power souces : 3
    Sample heating : <1000˚C
    Ar ion etching source : <1 kV
    RHEED with 25 kV
    Nano fabrication Platform
    info*@*nanofab.engg.nagoya-u.ac.jp
    Magnetron sputtering with 3 sources Magnetron sputtering with 3 sources Shimadzu HSR-522
    3 cathodes with 4 inches
    RF power sources : 500 W x 2
    Reverse sputtering of sample, Sample rotation, Multi-layered deposition
    Nano fabrication Platform
    info*@*nanofab.engg.nagoya-u.ac.jp
  • [Microfabrication/Processing Device]
    Facilities and Equipment Specifications Inquiry
    Electron beam lithography Electron beam lithography JEOL JBX6300FS
    Accelerating voltage:25/50/100kV
    Minimum beam diameter:2nm
    Beam current:100pA-2nA
    Superimposing Accuracy:±9nm
    Maximum sample size:8inchφ
    Nano fabrication Platform
    info*@*nanofab.engg.nagoya-u.ac.jp
    Mask aligner Mask aligner Canon PLA-501(S)
    Indefinite shape sample with thickness less than 0.7μm
    Nano fabrication Platform
    info*@*nanofab.engg.nagoya-u.ac.jp
    Reactive ion etching Reactive ion etching Samco RIE-1C
    Etching gas:CF4,O2
    RF power:150W
    Nano fabrication Platform
    info*@*nanofab.engg.nagoya-u.ac.jp
    ECR etching with SIMS ECR etching with SIMS ECR ion source:Irie Koken RGB-114
    Microwave input power:150 W,
    Accelerating voltage:600 V,Ion beam diameter:30mm
    SSIMS analyzer:PFEIFFER EDP400
    Mass analysis range:1-512 amu
    Sample rotation and tilting mechanism
    Nano fabrication Platform
    info*@*nanofab.engg.nagoya-u.ac.jp
    Ion implantation Ion implantation NISSIN Electric NH-20SR-WMH
    Accelerating voltage:5-200kV
    Beam current:1 µA~100 µA
    Nano fabrication Platform
    info*@*nanofab.engg.nagoya-u.ac.jp
    Femto-second laser for micro-fabrication and measurement Femto-second laser for micro-fabrication and measurement Kisou UFL-Hybrid System
    Pulse Laser:1041 nm, 550 fs, 10 µJ (IMRA µjewel D-1000)
    Harmonic generator:40% @520 nm, 5% @347 nm
    (Micro-fabrication Station)
    Maximum sample size:100 mm x 100 mm
    Laser beam diameter for fabrication:3.5 µmφ
    (Measurment Station)
    Time resolved fluorescent, Spin dynamics of magnetic materials
    (Optical Coherence Tomography Station)
    Observation area:10 mm x 10 mm x 1.6 mm
    Depth resolution:7 µm
    Nano fabrication Platform
    info*@*nanofab.engg.nagoya-u.ac.jp
    Electric furnace Electric furnace Koyo Thermo System Co. MODEL272-2
    Temperature range:400-1100˚C
    Nano fabrication Platform
    info*@*nanofab.engg.nagoya-u.ac.jp
    Rapid thermal annealing Rapid thermal annealing AG Associates Heatpulse 610
    Temperature range:400~1200˚C
    Temperature rasing rate:200˚C/sec
    Nano fabrication Platform
    info*@*nanofab.engg.nagoya-u.ac.jp
  • [Electronic Microscope & Associated Equipment]
    Facilities and Equipment Specifications Inquiry
    Reaction science high voltage scanning TEM Reaction science high voltage scanning TEM
    JEM1000K RS
    Acc. Vol.: 1000 kV (400, 600, 800 kV on demand)
    Electron gun: Thermal (LaB6)
    Mode: TEM/STEM
    Anal. Tool: GIF (Quantum equivalent)
    Recording: CCD (wide and high-res.)
    Specimen holder: cooling, heating, cryo-transfer, nano-indentation, 3D tomography, other custom-made holders
    E-cell: O2, N2, CO, H2,… up to 10,000 Pa
    Microstructure Analysis Platform
    nanoplat*@*nagoya-microscopy.jp
    Aberration corrected scanning TEM Aberration corrected scanning TEM
    JEM ARM200F
    Acc. Vol.: 200 kV, 80 kV
    Electron gun: Cold FEG
    Mode: TEM/STEM
    Cs correction: probe
    Anal. Tool: EDX (SDD: 100 mm2), GIF Quantum
    Recording: CCD
    Specimen holder: single-tilt, double-tilting, double-tilting Be analytical
    Others: Diffraction imaging
    Microstructure Analysis Platform
    nanoplat*@*nagoya-microscopy.jp
    Aberration corrected scanning TEM Aberration corrected scanning TEM
    JEM-10000BU
    Acc. Vol.: 200 kV, 80 kV
    Electron gun: Schottky FEG
    Mode: TEM/STEM
    Cs correction: probe & imaging
    Anal. Tool: EDX (SDD: 60 mm2), GIF Quantum
    Recording: CCD
    Specimen holder: single-tilt, double-tilting, double-tilting Be analytical
    Others: Bi-prism for holography, BSI detector
    Microstructure Analysis Platform
    nanoplat*@*nagoya-microscopy.jp
    Transmission electron microscope Transmission electron microscope
    JEM2100F-HK
    Acc. Vol.: 200kV
    Electron gun: Schottky FEG
    Mode: TEM/STEM
    Anal. Tool: EDX (SDD: 60 mm2)
    Recording: CCD
    Specimen holder: double-tilting cooling, double-tilting heating, multi-sample, Be analytical
    High voltage electron microscope laboratory
    Transmission electron microscope Transmission electron microscope
    H-800
    Acc. Vol.: 200kV
    Electron gun: Thermal (W fil.)
    Mode: TEM/STEM
    Anal. Tool: EDX (Si:Li detector)
    Recording: CCD
    Mainly for training students
    High voltage electron microscope laboratory
    Electron Spectroscopic scanning TEM Electron Spectroscopic scanning TEM
    JEM2100M
    Acc. Vol.: 80-200 kV
    Electron gun: Thermal (LaB6)
    Mode: TEM/STEM
    Anal. Tool: EDX (SDD: 30 mm2), WDX, EELS (Enfina), CL
    Recording: CCD
    Specimen holder: single-tilt, double-tilting, double-tilting Be analytical, rotation, cooling & heating
    Others: BSI detector
    Microstructure Analysis Platform
    nanoplat*@*nagoya-microscopy.jp
    FIB-SEM High-speed sample fabrication/analysis system
    MI-4000L
    Acc vol.:30kV (FIB, SEM)
    Anal. Tool: FE-SEM、EDS, EDSD
    Micro-sampling, Slice & See
    Microstructure Analysis Platform
    nanoplat*@*nagoya-microscopy.jp
    Focused ion beam sample preparation system Focused ion beam sample preparation system
    FB-2100
    Acc vol.:40kV
    Micro-sampling
    Microstructure Analysis Platform
    nanoplat*@*nagoya-microscopy.jp
    Precision ion beam milling system Precision ion beam milling system
    PIPS II
    Ion energy: 100 eV~8 keV
    Attachments: Digitally zooming microscope, specimen cooling stage
    Microstructure Analysis Platform
    nanoplat*@*nagoya-microscopy.jp
    Other instruments for sample preparation Other instruments for sample preparation Low speed blade saw, wire saw, mechanical lapping system, jet polishing (EcoPol), ultramicrotomy, Cross-section polisher, Dimpling machine, Gentle mill, ion coating machine, etc Microstructure Analysis Platform
    nanoplat*@*nagoya-microscopy.jp
    3D electron microscope 3D electron microscope FEI Tecnai G2 300kV Saitoh Koh Laboratory
    Field-emission scanning electron microscope Field-emission scanning electron microscope JEOL JSM-6330F & JED-2140GS Shared Equipment Facility
    shared.equip*@*imass.nagoya-u.ac.jp
    FE-SEM FE-SEM JEOL JSM-6301F
    Field-emission electron gun
    Accelerating voltage: 0.5~30kV
    Magnification: 10~500,000
    Analysis with energy dispersive X-ray spectrometry
    Nano fabrication Platform
    info*@*nanofab.engg.nagoya-u.ac.jp
    Scanning Electron microsope with Energy Dispersive X-ray Spectroscopy Scanning Electron microsope with Energy Dispersive X-ray Spectroscopy Hitachi High-Technologies
    SEMEDXⅢTypeN1
    Secondary electron image resolution : 3.0nm@ 25kV
    Backscattered electron image resolution :4.0nm
    Acceleration voltage:0.3~30kV
    Magnification: 5~300,000
    Shared Equipment Facility
    shared.equip*@*imass.nagoya-u.ac.jp
  • [Analysis Measurement Equipment]
    Facilities and Equipment Specifications Inquiry
    X-ray diffractometer X-ray diffractometer RIGAKU ATX-G
    X-ray sourse : Cu-Ka, 18kW
    Multilayered focusing mirror
    Ge monochromater
    θ-2θscan mode,Rocking curve,Reciprocal lattice mapping, In-plane φ scan,φ-2θχscan
    Nano fabrication Platform
    info*@*nanofab.engg.nagoya-u.ac.jp
    X-ray diffractometer X-ray diffractometer RIGAKU RINT2500TTR Shared Equipment Facility
    shared.equip*@*imass.nagoya-u.ac.jp
    Atomic force microscope Atomic force microscope Bruker, AXS Dimension3100
    Scan range:XY axes 90μm,Z axis 6μm
    Maximum sample size:150 mmφ-12mmt
    Measurement mode :  AFM,MFM,EFM,LFM,surface electric potential image,current image,lithography
    Nano fabrication Platform
    info*@*nanofab.engg.nagoya-u.ac.jp
    Magnetometers Magnetometers Alternative gradient force magnetometer, sensitivity :10^-8emu,maximum field : 20kOe
    Vibrating sample magnetometer, sensitivity :10^-5emu,maximum field : 15kOe
    Torque magnetometer:sensitivity :2×10^-3erg,maximum field : 15kOe
    Magneto-optical spectrometer, sensitivity :2×10^-3deg,maximum field : 16kOe
    Nano fabrication Platform
    info*@*nanofab.engg.nagoya-u.ac.jp
    X-ray photoelectron spectrometer X-ray photoelectron spectrometer VG ESCALAB210
    Mg/Al twin anode and Al monochromator X ray source
    Sample etching by Ar ion gun
    Manipulator for angle resolved measurement
    info*@*nanofab.engg.nagoya-u.ac.jp
    X-ray photoelectron spectrometer X-ray photoelectron spectrometer SHIMADZU ESCA-3300 Shared Equipment Facility
    shared.equip*@*imass.nagoya-u.ac.jp
    ICP atomic emission spectrometer Inductively Coupled Plasma Atomic Emission Spectrometer Seiko Instruments, SPS7800 Shared Equipment Facility
    shared.equip*@*imass.nagoya-u.ac.jp
    CHN coder CHN coder (Yanaco) MT-6 Shared Equipment Facility
    shared.equip*@*imass.nagoya-u.ac.jp
    Test apparatus of electrically driven small centrifugal compressor Test apparatus of electrically driven small centrifugal compressor Tx40MS Shared Equipment Facility
    shared.equip*@*imass.nagoya-u.ac.jp
    Liquid chromatograph/mass spectrometer Liquid chromatograph/mass spectrometer Micromass LCT Shared Equipment Facility
    shared.equip*@*imass.nagoya-u.ac.jp
    Laser doppler velocimeter for one velocity component Laser doppler velocimeter for one velocity component 1D-PDPA/FSA3500P Shared Equipment Facility
    shared.equip*@*imass.nagoya-u.ac.jp

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